Metallizing

VLSI metallization

edited by Norman G. Einspruch, Simon S. Cohen, Gennady Sh. Gildenblat.

Advanced metallization for devices and circuits--science, technology, and manufacturability: symposium held April 4-8, 1994, San Francisco, California, U.S.A.

editors, S.P. Murarka ... [et al.].

Copper-fundamental mechanisms for microelectronic applications

Shyam P. Murarka, Igor V. Verner, Ronald J. Gutmann

Advanced metallizations in microelectronics: symposium held April 16-20, 1990, San Francisco, California, U.S.A.

editors, Avishay Katz, Shyam P. Murarka, Ami Appelbaum.

Handbook of multilevel metallization for integrated circuits: materials, technology, and applications

edited by Syd R. Wilson and Clarence J. Tracy, John L. Freeman, Jr.

Advanced metallization and processing for semiconductor devices and circuits--II: symposium held April 27-May 1, 1992, San Francisco, California, U.S.A.

editors, Avishay Katz ... [et al.].

Analysis of LDEF experiment AO187-2 chemical and isotopic measurements of micrometeoroids by secondary ion mass spectrometry: final report NAG1-1174 to the National Aeronautics and Space Administration ; principal investigator, Ernst Zinner.

Ernst Zinner

Materials, integration and technology for monolithic instruments: symposium held March 29-30, 2005, San Francisco, California, USA

editors: Jeremy A. Theil ... [et al.].

Microelectronics technology and process integration: 20-21 October 1994, Austin, Texas

Fusen E. Chen, Shyam P. Murarka, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering.

Process, equipment, and materials control in integrated circuit manufacturing: 25-26 October 1995, Austin, Texas

Anant G. Sabnis, Ivo J. Raaijmakers, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.