Electron-beam, X-ray, and ion-beam technology
submicrometer lithographies IX : 7-8 March 1990, San Jose, California
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Author
Contributions
- Resnick, Douglas J. - Contributor
- Society of Photo-optical Instrumentation Engineers. - Contributor
Publication
1990 - SPIE--the International Society for Optical Engineering, Bellingham, Wash., USA, Washington (State)
Language
English
Word Count
86,000 words, Guess
Page Count
344 pages
Identifiers
- Open LibraryOL15302038M
- ISBN-100819403105
- OCLC Control Number21914564
- OCLC Control Numberisbn_0819403105_1263
- Library of Congress Control Number90060893
and 1 more
- Goodreads4519154
Alternate Titles
- Submicrometer lithographies nine.
Subjects
Topics
Series Statement
- Proceedings / SPIE--the International Society for Optical Engineering -- v. 1089
Other Editions
- Electron-beam, X-ray, and ion-beam technology: submicrometer lithographies IX : 7-8 March 1990, San Jose, California
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