Pulsed and pulsed bias sputtering
principles and applications
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Author
Contributions
- Lu, T.-M. 1943- - Contributor
Publication
2003 - Kluwer Academic, Boston, Massachusetts
Language
English
Word Count
38,750 words, Guess
Page Count
155 pages
Identifiers
- Internet Archivepulsedpulsedbias0000barn
- ISBN-10140207543X
- ISBN-139781402075438
- Goodreads5978013
- Library of Congress Control Number2003054987
and 2 more
- Better World Books9781402075438
- Open LibraryOL19290304M
Classifications
- DDC621.3815/2
- LCCTS695 .B27 2003
- LCCQC374-379
Subjects
Topics
SciencePhysicsGeneralThin filmsMaterial ScienceScience : PhysicsScience/MathematicsTechnology / OpticsEngineering - GeneralTechnology & Industrial ArtsElectronics - SemiconductorsTechnology : Material ScienceCathode sputtering (Plating prSemi-conductors & super-conductorsTechnology / Engineering / GeneralCathode sputtering (Plating process)
Other Editions
- Pulsed and pulsed bias sputtering: principles and applications
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