Advances in Low Temperature RF Plasmas. Basis for Process Design
1st edition
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Word Count
82,000 words, Guess
Page Count
328 pages
Physical Format
Hardcover
Identifiers
- Open LibraryOL10260302M
- ISBN-100444510958
- ISBN-139780444510952
- Goodreads4980521
- Library of Congress Control Number2002070662
Classifications
- LCCTA2020 .A63 2002
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