Photoacoustic, Photothermal and Photochemical Processes at Surfaces and in Thin Films
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Author
Publication
1989 - Springer Berlin Heidelberg, Berlin, Heidelberg, Germany
Language
English
Word Count
94,000 words, Guess
Page Count
376 pages
Physical Format
[electronic resource] /
Identifiers
- Open LibraryOL27080674M
- ISBN-139783642839474
- ISBN-103642839479
- OCLC Control Number851391881
- OCLC Control Numberphotoacousticpho00hess_516
Classifications
- DDC534
- LCCQC221-246
Description
Review articles by leading scientists in their fields are brought together in this volume to provide a comprehensive treatment of photoacoustic, photothermal and photochemical processes at surfaces and in thin films. The articles introduce the fields, review present knowledge and conclude with latest developments and future prospects. Topics covered include laser-induced desorption, ablation and surface damage; surface acoustic waves; photothermal and photoacoustic characterization of thin films and interfaces; depth profiling in the frequency and time domains; remote testing and nondestructive evaluation; materials characterization; and new theoretical approaches using fractals. The book will interest newcomers to photoacoustics, since it gives an overview of current research and details of experimental methods. It will also be a source of information for those already in the field due to its clear presentation of theory and experimental results. All relevant literature references in this rapidly expanding field are included.
Subjects
Series Statement
- Topics in Current Physics -- 47
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