Effect of Disorder and Defects in Ion-Implanted Semiconductors
Electrical and Physiochemical Characterization, Volume 45 (Semiconductors and Semimetals)
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Contributions
- Constantinos Christofides (Editor) - Contributor
- Gerard Ghibaudo (Editor) - Contributor
- Robert K. Willardson (Series Editor) - Contributor
- Eicke R. Weber (Series Editor) - Contributor
Publication
1997-04-22 - Academic Press
Language
English
Word Count
75,000 words, Guess
Page Count
300 pages
Physical Format
Hardcover
Identifiers
- Internet Archiveeffectdisorderde00chri_203
- ISBN-100127521453
- ISBN-139780127521459
- Goodreads3372111
- Better World Books9780127521459
and 1 more
- Open LibraryOL9817063M
First Sentence
Ion implantation was first used in manufacturing integrated circuits in the early 1970s.
Subjects
Other Editions
- Effect of Disorder and Defects in Ion-Implanted Semiconductors: Electrical and Physiochemical Characterization, Volume 45 (Semiconductors and Semimetals)
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