Evolution of thin film morphology
modeling and simulations
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Author
Contributions
- Lu, T.-M. 1943- - Contributor
Publication
2008 - Springer, New York, New York (State)
Language
English
Word Count
51,000 words, Guess
Page Count
204 pages
Identifiers
- Internet Archiveevolutionthinfil00pell_267
- Internet Archiveevolutionthinfil00pell_336
- Internet Archiveevolutionofthinf0000pell
- Internet Archiveevolutionthinfil00pell
- ISBN-100387751084
and 7 more
- ISBN-139780387751085
- Goodreads2545476
- LibraryThing8250015
- Library of Congress Control Number2007940880
- OCLC Control Number173718721
- Better World Books9780387751085
- Open LibraryOL16488095M
Classifications
- DDC621.38152
- LCCTK7872.T55 P45 2008
- LCCTA418.7-418.76
Subjects
Topics
Thin filmsVapor-platingMicrostructureThin film devicesMathematical modelsChemical vapor depositionThin films -- MicrostructureThin films -- Mathematical models
Series Statement
- Springer series in materials science -- v. 108
Other Editions
- Evolution of thin film morphology: modeling and simulations
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