Copper interconnects, new contact metallurgies/structures, and low-k interlevel dielectrics II
proceedings of the international symposium
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Contributions
- Mathad, G. S. - Contributor
- Bakshi, V. - Contributor
- Electrochemical Society. Dielectric Science and Technology Division - Contributor
- Electrochemical Society. Electronics Division. - Contributor
- Electrochemical Society. Electrodeposition Division. - Contributor
and 1 more
- Electrochemical Society. Meeting. - Contributor
Publication
2003 - Electrochemical Society, Pennington, N.J, New Jersey
Language
English
Word Count
69,000 words, Guess
Page Count
276 pages
Identifiers
- ISBN-101566773903
- ISBN-139781566773904
- Goodreads7100738
- Library of Congress Control Number2003110702
- Open LibraryOL3698032M
Classifications
- LCCTK7874 I47355 2003
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