Copper interconnects, new contact metallurgies/structures, and low-k interlevel dielectrics
proceedings of the international symposium
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Contributions
- Mathad, G. S. - Contributor
- Rathore, Harzara S. - Contributor
- Electrochemical Society. Dielectric Science and Technology Division. - Contributor
- Electrochemical Society. Electronics Division. - Contributor
- Electrochemical Society. Electrodeposition Division. - Contributor
and 1 more
- Electrochemical Society. Meeting - Contributor
Publication
2001 - Electrochemical Society, Pennington, NJ, New Jersey
Language
English
Word Count
56,000 words, Guess
Page Count
224 pages
Identifiers
- ISBN-10156677294X
- ISBN-139781566772945
- Library of Congress Control Number2001086649
- Open LibraryOL3956814M
Classifications
- DDC621.3815
- LCCTK7874 .S888 2000
Subjects
Genres
- Congresses
Series Statement
- Proceedings ;
- v. 2000-27
- Proceedings (Electrochemical Society) ;
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