Chemical Vapor Deposition Polymerization
The Growth and Properties of Parylene Thin Films
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Author
Contributions
- Lu, Toh-Ming - Contributor
Publication
2004 - Springer US, Boston, MA, United States
Language
English
Word Count
25,500 words, Guess
Page Count
102 pages
Physical Format
Electronic resource
Identifiers
- Internet Archivechemicalvapordep00phdj
- Internet Archivechemicalvapordep00phdj_632
- ISBN-101441954139
- ISBN-10147573901X
- ISBN-139781441954138
and 5 more
- ISBN-139781475739015
- OCLC Control Number851790634
- Better World Books9781441954138
- Better World Books9781475739015
- Open LibraryOL27023877M
Classifications
- DDC620.11
- LCCTA404.6
- LCCQC1-75
and 1 more
- LCCQC173.458.S87
Description
Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.
Subjects
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