Contributions

  • Lu, Toh-Ming - Contributor

Publication

2004 - Springer US, Boston, MA, United States

Language

English

Word Count

25,500 words, Guess

Page Count

102 pages

Physical Format

Electronic resource

Identifiers

and 5 more
  • ISBN-139781475739015
  • OCLC Control Number851790634
  • Better World Books9781441954138
  • Better World Books9781475739015
  • Open LibraryOL27023877M

Classifications

  • DDC620.11
  • LCCTA404.6
  • LCCQC1-75
and 1 more
  • LCCQC173.458.S87

Description

Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.

Subjects

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