Contributions

  • Gras-Marti, Alberto - Contributor
  • Valles-Abarca, Jose Antonia - Contributor
  • Flamm, Daniel L. - Contributor

Publication

1990 - Springer Netherlands, Dordrecht, Netherlands

Language

English

Word Count

144,000 words, Guess

Page Count

576 pages

Physical Format

Electronic resource

Identifiers

and 1 more

Classifications

  • DDC620.11
  • LCCTA404.6
  • LCCTP1-1185

Alternate Titles

  • Proceedings of the NATO Advanced Study Institute, Alicante, Spain, September 4-16, 1988

Description

An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. <br/> The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. <br/> The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.

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