Materials for microlithography
radiation-sensitive polymers
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Contributions
- Thompson, L. F., 1944- - Contributor
- Willson, C. G. 1939- - Contributor
- Fréchet, Jean M. J. - Contributor
- American Chemical Society. Division of Polymeric Materials: Science and Engineering. - Contributor
- American Chemical Society. Division of Polymer Chemistry. - Contributor
and 1 more
- American Chemical Society. Meeting - Contributor
Publication
1984 - The Society, Washington, D.C, District of Columbia
Language
English
Word Count
123,500 words, Guess
Page Count
494 pages
Identifiers
- Internet Archivematerialsformicr00frec
- Internet Archivematerialsformicr0000unse
- ISBN-100841208719
- ISBN-139780841208711
- Goodreads1256692
and 2 more
- Library of Congress Control Number84021744
- Open LibraryOL2859045M
Classifications
- DDC621.381/73
- LCCTK7871.15.P6 M37 1984
Alternate Titles
- Radiation-sensitive polymers.
Subjects
Topics
PolymersMaterialsCongressesPhotoresistsMicroelectronicsMicrolithographyPolymers -- CongressesPhotoresists -- CongressesMicroelectronics -- Materials -- CongressesMicrolithography -- Materials -- Congresses
Series Statement
- ACS symposium series,
- 266
Other Editions
- Materials for microlithography: radiation-sensitive polymers
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