Atomic Layer Deposition Of Nanostructured Materials
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Word Count
109,000 words, Guess
Page Count
436 pages
Identifiers
- ISBN-139783527327973
- ISBN-103527327975
- OCLC Control Number768067387
- Better World Books9783527327973
- Open LibraryOL26114797M
Classifications
- LCCTS695
Description
"Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique)."--pub. desc.
Subjects
Other Editions
- Atomic Layer Deposition Of Nanostructured Materials
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