Chemical vapor deposition
principles and applications
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Author
Contributions
- Hitchman, Michael L. - Contributor
- Jensen, Klavs F., 1952- - Contributor
Publication
1993 - Academic Press, London, England
Language
English
Word Count
169,250 words, Guess
Page Count
677 pages
Identifiers
- Open LibraryOL1466154M
- ISBN-100123496705
- OCLC Control Number27995365
- Library of Congress Control Number93125773
- Goodreads5146558
Classifications
- DDC620/.44
- LCCTS695 .C54 1993
Subjects
Topics
Vapor-platingSolid state physicsElectric engineeringChemical vapor depositionChemical vapor deposition.
Other Editions
- Chemical vapor deposition: principles and applications
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