Photomask and next-generation lithography mask technology XIV
17-19 April 2007, Yokohama, Japan
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Contributions
- Watanabe, Hidehiro. - Contributor
- Photomask Japan. - Contributor
- BACUS (Technical group) - Contributor
- Society of Photo-optical Instrumentation Engineers. - Contributor
Publication
2007 - SPIE, Bellingham, Wash, Washington (State)
Language
English
Word Count
0 words, Guess
Page Count
0 pages
Identifiers
- ISBN-100819467456
- ISBN-139780819467454
- Library of Congress Control Number2007281758
- OCLC Control Number166421286
- Better World Books9780819467454
and 1 more
- Open LibraryOL16383899M
Classifications
- DDC621.3815/31
- LCCTK7872.M3 P4626 2007
- LCCTK7872.M3P4626 2007
Alternate Titles
- Photomask and X-ray mask technology
Subjects
Topics
MasksCongressesMicrolithographyX-ray lithographyIntegrated circuitsMasks (Electronics)Optoelectronic devicesDesign and constructionMicrolithography -- CongressesX-ray lithography -- CongressesMasks (Electronics) -- CongressesIntegrated circuits -- Masks -- CongressesOptoelectronic devices -- Design and construction -- Congresses
Genres
- Congresses
Series Statement
- Proceedings of SPIE -- 6607
- Proceedings of SPIE--the International Society for Optical Engineering -- v. 6607.
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