Microlithography -- Congresses

Nonlithographic and Lithographic Methods of Nanofabrication--From Ultralarge-Scale Integration to Photonics to Molecular Electronics: Symposium Held November ... Society Symposia Proceedings, V. 636.)

Lhadi Merhari

MicrocircuitEngineering 89: proceedings of the International Conference on Microlithography, September 26-28, 1989, Cambridge, England

edited by H. Ahmed ... (et al.).

Introduction to microlithography: theory, materials, and processing

L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983.

Optical microlithography XVI: 25-28 February 2003, Santa Clara, California, USA

Anthony Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

Optical microlithography XV: 5-8 March, 2002, Santa Clara, [California], USA

Anthon Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

Photomask and next-generation lithography mask technology XIV: 17-19 April 2007, Yokohama, Japan

Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.

Introduction to microlithography

edited by Larry F. Thompson, C. Grant Willson, Murrae J. Bowden.

Microprocesses and nanotechnology 2001: 2001 International Microprocesses and Nanotechnology Conference, October 31-November 2, 2001, Shimane, Japan : digest of papers

sponsored by the Japan Society of Applied Physics ; technical-cosponsored [by] IEEE Electron Device Society ; cooperation, American Vacuum Society ... [et al.].

Photomask and next-generation lithography mask technology IX: 23-25 April, 2002, Yokohama, Japan

Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering.

Microlithography 1999: Advances in Resist Technology and Processing XVI : Proceedings of Spie 15-17 March 1999 Santa Clara, California (Proceedings of SPIE)

Will Conley