Photomask and next-generation lithography mask technology IX
23-25 April, 2002, Yokohama, Japan
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Contributions
- Kawahira, Hiroichi. - Contributor
- Photomask Japan. - Contributor
- BACUS (Technical group) - Contributor
- Ōyō Butsuri Gakkai. - Contributor
- Semiconductor Equipment and Materials International (Japan) - Contributor
and 1 more
- Society of Photo-optical Instrumentation Engineers. - Contributor
Publication
2002 - SPIE, Bellingham, Wash, Washington (State)
Language
English
Word Count
229,500 words, Guess
Page Count
918 pages
Identifiers
- Internet Archivephotomasknextgen4754phot
- ISBN-100819445177
- ISBN-139780819445179
- Goodreads3598747
- Library of Congress Control Number2004272510
and 3 more
- OCLC Control Number50613555
- Better World Books9780819445179
- Open LibraryOL3320498M
Classifications
- DDC621.3815/31
- LCCTK7878 .P565 2002
Alternate Titles
- Photomask and X-ray mask technology
Subjects
Topics
MasksCongressesMicrolithographyX-ray lithographyIntegrated circuitsMasks (Electronics)Optoelectronic devicesDesign and constructionMicrolithography -- CongressesX-ray lithography -- CongressesMasks (Electronics) -- CongressesIntegrated circuits -- Masks -- CongressesOptoelectronic devices -- Design and construction -- Congresses
Genres
- Congresses
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