Optical microlithography XVI
25-28 February 2003, Santa Clara, California, USA
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Author
Contributions
- Yen, Anthony. - Contributor
- Society of Photo-optical Instrumentation Engineers. - Contributor
- Semiconductor Equipment and Materials International. - Contributor
- International SEMATECH. - Contributor
Publication
2003 - SPIE, Bellingham, Wash., USA, Washington (State)
Language
English
Word Count
441,000 words, Guess
Page Count
1,764 pages
Identifiers
- ISBN-100819448451
- ISBN-139780819448453
- Goodreads3620312
- Library of Congress Control Number2004296396
- OCLC Control Number52636014
and 2 more
- Better World Books9780819448453
- Open LibraryOL3323613M
Classifications
- DDC621.3815/31
- LCCTK7872.M3 O685 2004
- LCCTK7872.M3.O685 2004
and 1 more
- LCCTK7835 .O664 2003
Alternate Titles
- Optical microlithography sixteen
- Optical Microlithography 16
Subjects
Genres
- Congresses
Series Statement
- SPIE proceedings series,
- v. 5040
- Proceedings of SPIE--the International Society for Optical Engineering ;
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