Author

Contributions

  • Okabayashi, Hidekazu. - Contributor
  • Shingubara, Shoso. - Contributor
  • Ho, P. S. - Contributor
  • International Workshop on Stress-Induced Phenomena in Metallization (4th : 1997 : Tokyo, Japan) - Contributor

Publication

1998 - American Institute of Physics, Woodbury, N.Y, New York (State)

Language

English

Word Count

129,750 words, Guess

Page Count

519 pages

Identifiers

  • Open LibraryOL712019M
  • ISBN-101563966824
  • OCLC Control Number38918611
  • Library of Congress Control Number97077868
  • Goodreads4618426

Classifications

  • DDC621.3815
  • LCCTK7871.85 .S773 1998

Subjects

Topics

DefectsCongressesSemiconductorsMetallic filmsAluminum filmsElectrodiffusionThin film devices

Series Statement

  • AIP conference proceedings ;

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