Microlithography fundamentals in semiconductor devices and fabrication technology
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Author
Contributions
- Ueno, Takumi, 1951- - Contributor
- Ito, Toshio, 1952- - Contributor
Publication
1998 - Marcel Dekker, New York, New York (State)
Language
English
Word Count
81,750 words, Guess
Page Count
327 pages
Identifiers
- Open LibraryOL345225M
- ISBN-100824799518
- OCLC Control Number45842890
- OCLC Control Number38948131
- Library of Congress Control Number98004222
and 2 more
- Goodreads4032470
- LibraryThing8796858
Classifications
- DDC621.3815/2
- LCCTK7871.85 .N66 1998
Description
Ranging from the basic principles to the forefront of microlithography, this unique volume explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing.
Subjects
Topics
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