Semiconductors -- Etching

Lithography process control

Harry J. Levinson.

Silicon processing for the VLSI era

Stanley Wolf, Richard N. Tauber.

Osobennosti abrazivnoĭ i khimicheskoĭ obrabotki poverkhnosti poluprovodnikov: monografii͡a︡

V.A. Perevoshchikov, V.D. Skupov.

Etching of III-V semiconductors: an electrochemical approach

P.H.L. Notten, J.E.A.M. van den Meerakker, J.J. Kelly.

Applications of plasma processes to VLSI technology

edited by Takuo Sugano ; translated by Hyo-gun Kim.

Dry etching for microelectronics

edited by Ronald A. Powell.

Plasma processing of semiconductors

edited by P.F. Williams.

Ätzpraxis für Halbleiter.

[Von] A.F. Bogenschütz. Mit 209 Bildern und 12 Tabellen.

Fiziko-khimicheskie metody obrabotki poverkhnosti poluprovodnikov

pod redakt͡s︡ieĭ B.D. Luft ; [avtory B.D. Luft ... et al.].

Plasma etching and reactive ion etching

J.W. Coburn.