Lithography process control
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Author
Publication
1999 - SPIE Optical Engineering Press, Bellingham, Wash, Washington (State)
Language
English
Word Count
47,500 words, Guess
Page Count
190 pages
Identifiers
- Internet Archivelithographyproce0000levi
- ISBN-100819430528
- ISBN-139780819430526
- Goodreads1579467
- Library of Congress Control Number98044433
Classifications
- DDC621.3815/2
- LCCTK7871.85 .L464 1999
- LCCTK7871.85.L464 1999
and 1 more
- LCCTK7871.85 .L464 1999eb
Description
x, 190 p. : 26 cm
Subjects
Topics
EtchingQualitéContrôleMechanicalLithografieSemiconductorsQuality controlMicrolithographySemi-conducteursAttaque chimiqueMicrolithographieCommande de processusTECHNOLOGY & ENGINEERINGSemiconductors -- EtchingStatistische ProzesslenkungMicrolithography -- Quality controlLithographie (Halbleitertechnologie)
Series Statement
- Tutorial texts in optical engineering ;
- v. TT 28
Other Editions
- Lithography process control
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